Influence of Nitrogen Carrier Gas on the Optical, Structural, Mechanical and Electrical Properties of Aluminium-Doped Zinc Oxide Thin Films Deposited via AACVD

Authors

  • Kingsley Imoni-Ogbe University of Delta, Agbor
  • Onyekachukwu Mike Osiele Department of Physics, Delta State University, Abraka, Delta State, Nigeria.
  • Vincent Akpoveta Department of Chemical Sciences, Dennis Osadebay University, Asaba, Delta State, Nigeria.
  • Queen Umudi Deprtment of Chemistry, University of Delta, Agbor, Delta State, Nigeria.
  • Bright Ugbolu Department of Chemistry and Biochemistry, Florida State University, Tallahasse, Fl, 323.6, USA
  • Oscar Enajite Department of Physical Sciences, Dennis Osadebay University, Asaba, Delta State, Nigeria.

DOI:

https://doi.org/10.37933/nipes/7.2.2025.1

Keywords:

Aluminium-doped Zinc Oxide (AZO), Optical properties, Aerosol-Assisted Chemical Vapour Deposition (AACVD), Nitrogen carrier gas, Structural properties, Electrical properties

Abstract

This study analyses the optical characteristics, together with the structural, mechanical, and electrical attributes of Aluminium-doped Zinc Oxide (AZO) thin films produced through Aerosol-Assisted Chemical Vapour Deposition (AACVD), using nitrogen (N₂) gas as the transport medium. The deposition occurred at 400°C, while the soda-lime glass substrates received annealing treatment at 450°C within a nitrogen atmosphere.  X-ray Diffraction (XRD) analysis showed improved crystal formation through distinct peaks at (220), (311), and (222), as aluminium-doping levels rose and simultaneously generated small crystallite particles, rising dislocation density levels with expanded lattice deformations. The Scanning Electron Microscopy analysis revealed hexagonal ZnO grains evolved into irregularly shaped small grains, accompanied by higher densities of defects as Al compositions increased in the ZnO material. Profilometry analysis showed that the ZnO  film layer got thicker from 102 nm in undoped ZnO to 115 nm in 20% Al-doped ZnO. The maximum UV absorbance took place at 5% Al doping, while the bandgap expanded from 3.21 eV (undoped ZnO) to 3.33 eV (20% Al-doped ZnO) from the UV-Visible spectroscopic analysis, which is attributed to the Burstein-Moss effect. The peak concentration of 1.0 × 10²¹ cm⁻³ carriers was observed during Hall effect tests at 5% Al doping, yet it decreased as the doping concentration surpassed this level, due to defects that  trapped additional charges. More than half of the doping groups (Al) improved UV ray absorption between 15-20%, but the film’s mechanical structure deteriorated during testing. The study demonstrates the efficiency of nitrogen gas in modifying AZO film characteristics, which results in suitable applications for transparent electrodes, solar cells, and photodetectors, because of its adaptable electrical and optical features.

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Published

2025-05-20

How to Cite

Imoni-Ogbe, K., Onyekachukwu Mike Osiele, Vincent Akpoveta, Queen Umudi, Bright Ugbolu, & Oscar Enajite. (2025). Influence of Nitrogen Carrier Gas on the Optical, Structural, Mechanical and Electrical Properties of Aluminium-Doped Zinc Oxide Thin Films Deposited via AACVD. NIPES - Journal of Science and Technology Research, 7(2), 1–22. https://doi.org/10.37933/nipes/7.2.2025.1

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